Effect of applied stress on pitting corrosion behavior of type 304 stainless steel in chloride environment

Shimpei Tokuda, Izumi Muto, Yu Sugawara, Nobuyoshi Hara

研究成果: Conference contribution

5 被引用数 (Scopus)


Electrochemical measurements with and without stress were conducted to clarify the effect of applied stress on pitting corrosion behavior. In potentiodynamic polarization, the increase of the chloride ion concentration led to the formation of shallower pits. In immersion tests with and without stress in the 4 M MgCl2 solution at pH 5, the pit was formed slightly earlier under applied stress. However, there is no or little effect of stress on the corrosion potential before and after the pit initiation. Furthermore, the pit morphology was changed by applied stress, suggesting applied stress causes the increases in anodic dissolution rate and depassivation pH. No remarkable difference in the anodic dissolution rate was observed in potentiodynamic polarization in 4 M MgCl2 solution at pH 1. Depassivation pHs measured in 4 M MgCl2 solution with and without stress were 1.4 and 1.3 in, respectively. Depassivation pH increased by applied stress.

ホスト出版物のタイトルECS Transactions
編集者A. P. Abbott, R. Alkire, P. Allongue, T. J. Anderson, P. N. Bartlett, M. Bayachou, S. Bhansali, N. Birbilis, A. B. Bocarsly, C. Bock, O. V. Boltalina, S. Brankovic, R. Buchheit, D. A. Buttry, S. Calabrese Barton, M. T. Carter, V. Chaitanya, G. T. Cheek, Z. Chen, D. Chidambaram, B. A. Chin, J. W. Choi, D. Chu, D. E. Cliffel, H. Deligianni, V. Di Noto, N. Dimitrov, M. Doeff, E. A. Douglas, T. Druffel, K. Edstrom, J. M. Fenton, J. Fergus, J. Fransaer, Y. Fukunaka, D. Guyomard, H. Hamada, L. M. Haverhals, P. Hesketh, A. C. Hillier, J. K. Hite, H. Imahori, M. Inaba, M. Innocenti, M. Itagaki, C. Johnson, H. Katayama, S. H. Kilgore, D. J. Kim, J. Koehne, R. Kostecki, G. Krumdick, P. J. Kulesza, J. Leddy, J. J. Lee, O. Leonte, Y. C. Lu, B. L. Lucht, R. P. Lynch, M. Manivannan, R. A. Mantz, P. Marcus, V. Maurice, M. Mauter, J. Mauzeroll, H. N. McMurray, Y. S. Meng, E. L. Miller, I. Milosev, S. D. Minteer, S. Mitra, S. Mukerjee, R. Mukundan, J. Muldoon, L. Nagahara, S. R. Narayan, P. M. Natishan, M. Navaei, J. D. Nicholas, J. Noel, S. S. Nonnenmann, C. O'Dwyer, M. E. Orazem, Y. Oren, J. G. Park, P. Pharkya, P. N. Pintauro, S. Pylypenko, K. Rajeshwar, R. P. Ramasamy, C. Rhodes, D. P. Riemer, D. Roeper, M. Rohwerder, L. Romankiw, S. V. Rotkin, J. L. M. Rupp, M. J. Sailor, D. T. Schwartz, P. K. Sekhar, N. Sharma, A. Simonian, D. K. Smith, K. C. Smith, L. Soleymani, G. R. Stafford, J. A. Staser, V. Subramanian, V. R. Subramanian, K. B. Sundaram, A. H. Suroviec, K. Suto, M. Tao, T. Tatsuma, P. C. Trulove, P. Vanysek, N. Vasiljevic, J. T. Vaughey, S. Virtanen, H. Wang, W. Wang, J. F. Whitacre, G. Williams, M. Winter, D. L. Wood, G. Wu, N. Wu, J. Xiao, Y. Xing, H. Xu, J. J. Yang, G. Zangari
出版社Electrochemical Society Inc.
出版ステータスPublished - 2017
イベント232nd ECS Meeting - National Harbor, United States
継続期間: 2017 10 12017 10 5


名前ECS Transactions


Other232nd ECS Meeting
国/地域United States
CityNational Harbor

ASJC Scopus subject areas

  • 工学(全般)


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