Edge effects on plasmonic nanolithography

Xiangang Luo, Teruya Ishihara

研究成果: Conference contribution

抄録

Edge effects were investigated on the quality of resist patterns based on finite difference time domain (FDTD) calculations. The interference of the surface plasmon leads to nanoscale spatial distribution of light intensity, which reradiate into the photoresist. The edge effects can be removed by adding a layer of refractive-index-matched materials on the exit side of the mask. It was found that, depending on the thickness of the protection layer, the width of the resist pattern can be controlled.

本文言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2004
ページ132-133
ページ数2
出版ステータスPublished - 2004 12月 1
外部発表はい
イベント2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
継続期間: 2004 10月 262004 10月 29

Other

Other2004 International Microprocesses and Nanotechnology Conference
国/地域Japan
CityOsaka
Period04/10/2604/10/29

ASJC Scopus subject areas

  • 工学(全般)

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