Dynamic chemical mapping near a Si/SiO2 interface at elevated temperatures using plasmon-loss images

K. Sasaki, S. Tsukimoto, M. Konno, T. Kamino, H. Saka

    研究成果: Article査読

    6 被引用数 (Scopus)

    抄録

    Plasmon-loss imaging was applied to chemical mapping during an in-situ heating experiment. The technique was applied to observation of vibration of a Si/SiO2 interface which took place during reduction of SiO2 at high temperature. The chemical maps of Si and SiO2 were recorded dynamically using a conventional TV-VTR system at a time resolution of 1/30 s.

    本文言語English
    ページ(範囲)12-16
    ページ数5
    ジャーナルJournal of Microscopy
    203
    1
    DOI
    出版ステータスPublished - 2001 8 6

    ASJC Scopus subject areas

    • Pathology and Forensic Medicine
    • Histology

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