Direct growth of metallic TiH2 thin films by pulsed laser deposition

Kohei Yoshimatsu, Takayuki Suzuki, Nobuo Tsuchimine, Koji Horiba, Hiroshi Kumigashira, Takayoshi Oshima, Akira Ohtomo

研究成果: Article査読

4 被引用数 (Scopus)

抄録

We report the layer-by-layer growth and electronic properties of (111)-oriented, nearly stoichiometric TiH2 films (δ-phase) pulsed-laser-deposited on α-Al2O3(0001) using a TiH2 ceramic target. The content of the δ-phase increased as the decomposition to the Ti metal was suppressed at low temperatures. Moreover, long-lasting oscillations of reflection high-energy electron diffraction intensity were observed during the initial growth of the δ-phase film. The film showed metallic conductivity down to low temperatures. The results of Ti 2p-3d resonant photoemission spectroscopy and Hall measurement were consistent with those of the conducting electrons residing in the Ti 3d states.

本文言語English
論文番号035801
ジャーナルApplied Physics Express
8
3
DOI
出版ステータスPublished - 2015 3 1
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント 「Direct growth of metallic TiH<sub>2</sub> thin films by pulsed laser deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル