Ag microwiring with submicron resolution was fabricated by the laser-induced pyrolysis of a film prepared from liquid-dispersed Ag nanoparticles. The linewidth of the wiring fabricated by this laser direct-write maskless technique can be controlled flexibly by the laser beam focusing conditions. The resistivity of the Ag wiring fabricated by this technique (1.9 × 10-6 Ω cm) is comparable with that of bulk Ag (1.6 × Ω cm).
|ジャーナル||Japanese Journal of Applied Physics, Part 2: Letters|
|出版ステータス||Published - 2005 9 5|
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