Development of high-yield fabrication technique for MEMS-PhC devices

A. Higo, S. Iwamoto, S. Ishida, Y. Arakawa, M. Tokushima, A. Gomyo, H. Yamada, H. Fujita, H. Toshiyoshi

    研究成果: Article査読

    4 被引用数 (Scopus)

    抄録

    We propose a high-yield fabrication processing technique for the MEMS (micro electro mechanical system) modulators integrated with two-dimensional photonic crystal waveguides. Polysilicon microactuators for evanescent modulation was successfully developed by using the vapor hydrofluoric-acid releasing technique for stiction-free sacrificial release, during which the SOI photonic-crystal waveguides were protected under the LPCVD silicon nitride film. Post-release anneal was found to be needed to remove the byproduct made by the reaction of hydrofluoric acid with silicon nitride film. Preliminary optical modulation result (-2 dB modulation with 86 V) was experimentally obtained.

    本文言語English
    ページ(範囲)39-43
    ページ数5
    ジャーナルIEICE Electronics Express
    3
    3
    DOI
    出版ステータスPublished - 2006 2 10

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

    フィンガープリント 「Development of high-yield fabrication technique for MEMS-PhC devices」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル