X-ray ptychography allows us to observe the internal structures of non-isolated objects without lenses. We developed a high-accuracy X-ray ptychography apparatus equipped with Kirkpatrick-Baez mirrors. The full width at half-maximum of the focal profiles was ∼600 nm for the vertical and horizontal directions. The estimated flux was ∼3×107 photons/s. We also developed a constant-temperature system to suppress sample and/or beam drift during measurements. The temperature change of the apparatus was controlled to less than 0.04 °C over 10 hours. The total amount of drift over 10 hours was suppressed to less than 500 nm. By using both the constant-temperature system and a drift compensation method, the reconstructed image of the test object was markedly improved.
|ジャーナル||Journal of Physics: Conference Series|
|出版ステータス||Published - 2013|
|イベント||11th International Conference on X-Ray Microscopy, XRM 2012 - Shanghai, China|
継続期間: 2012 8 5 → 2012 8 10
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