Development of half-metallic ultrathin Fe3O4 films for spin-transport devices

Susumu Soeya, Jun Hayakawa, Hiromasa Takahashi, Kenchi Ito, Chisato Yamamoto, Ayumu Kida, Hidefumi Asano, Masaaki Matsui

研究成果: Article査読

187 被引用数 (Scopus)

抄録

We attempted to fabricate a high-quality Fe3O4 film while satisfying both low-thermal preparation (≦573 K) and film thinness (≦500 Å). X-ray diffractometry showed that our prepared Fe 3O4 film was epitaxially grown onto a MgO (100) substrate. The saturation magnetization, resistivity, and Verwey point were, respectively, ∼438emu/cm3, ∼10000μcm, and ∼110K. These values were comparable to those of the Fe3O4 bulk. Our experimental results suggested that a high-quality Fe3O4 film could be obtained even under the crucial conditions of the deposition temperature being low (∼523 K) and the film being ultrathinned (∼100 Å).

本文言語English
ページ(範囲)823-825
ページ数3
ジャーナルApplied Physics Letters
80
5
DOI
出版ステータスPublished - 2002 2月 4

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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