Development of an automated vapor/liquid hybrid deposition system to form high-k dielectrics

Daisuke Hojo; Yi Xuan; Tetsuji Yasuda

doi:10.1002/cvde.200506438

Development of an automated vapor/liquid hybrid deposition system to form high-k dielectrics

Daisuke Hojo, Yi Xuan, Tetsuji Yasuda

未来科学技術共同研究センター

研究成果: Article › 査読

2 被引用数 (Scopus)

抄録

Vapor/liquid hybrid deposition (VALID) is a modified atomic layer deposition (ALD) method that combines adsorption of metal precursors from the vapor phase with their hydrolysis from the liquid phase. This paper is a report of the development of an automated VALID apparatus that performs the adsorption/hydrolysis processes with a reasonable throughput. HfO₂ films have been successfully produced with this automated system using Hf(O′C₄H₉)₄ [hafnium tetra-fert-butoxide (HTB)]as the precursor. A brief discussion is given on the contribution of multilayer adsorption of HTB to the observed deposition rates.

本文言語	English
ページ（範囲）	214-219
ページ数	6
ジャーナル	Chemical Vapor Deposition
巻	12
号	4
DOI	https://doi.org/10.1002/cvde.200506438
出版ステータス	Published - 2006 4 1

ASJC Scopus subject areas

Electrochemistry
Process Chemistry and Technology
Surfaces, Coatings and Films
Surfaces and Interfaces
Condensed Matter Physics
Electronic, Optical and Magnetic Materials

文献へのアクセス

10.1002/cvde.200506438

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引用スタイル

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