In an r.f. glow-discharge plasma, a d.c. bias current can be introduced by connecting an electric circuit comprising a low-pass filter and a variable resistor. The bias current promotes the emission excitations in the plasma, leading to an improvement of the detection power in the optical emission spectrometry. By conducting a bias current of 27mA, the emission intensities of atomic resonance lines were several times larger than those obtained with conventional r.f.-powered plasmas. The detection limits for determination of alloyed elements in Fe-based low alloyed standard samples were estimated to be 3 ppm Cu for Cu I 324.75 nm, 10 ppm Ni for Ni I 352.45 nm, 6 ppm Ti for Ti I 364.267 nm, and 7 ppm B for B I 208.96 nm.
|ジャーナル||Tetsu-To-Hagane/Journal of the Iron and Steel Institute of Japan|
|出版ステータス||Published - 2005 5|
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