Design and experimental approach of optical reflection filters with graded refractive index profiles

X. Wang, H. Masumoto, Y. Someno, T. Hirai

研究成果: Article査読

22 被引用数 (Scopus)

抄録

A novel optical multilayer filter with graded refractive index profiles using a quarterwave stack was designed. This filter exhibits a high reflectance band, a sharp cutoff and a wide transmittance region as the result of sidelobe suppression. A 31 layer TiO2/SiO2 high reflectance filter with a graded refractive index profile was fabricated by helicon plasma sputtering on BK7 and Si (100) substrates. The deposition system was operated under ambient gas pressure of 1.8×10-1 Pa at room temperature. The measured transmittance of the spectrum was in good accord with calculated results. Transmission electron microscopic observations confirmed the expected microstructure of the filter.

本文言語English
ページ(範囲)206-211
ページ数6
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
17
1
DOI
出版ステータスPublished - 1999

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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