A novel optical multilayer filter with graded refractive index profiles using a quarterwave stack was designed. This filter exhibits a high reflectance band, a sharp cutoff and a wide transmittance region as the result of sidelobe suppression. A 31 layer TiO2/SiO2 high reflectance filter with a graded refractive index profile was fabricated by helicon plasma sputtering on BK7 and Si (100) substrates. The deposition system was operated under ambient gas pressure of 1.8×10-1 Pa at room temperature. The measured transmittance of the spectrum was in good accord with calculated results. Transmission electron microscopic observations confirmed the expected microstructure of the filter.
|ジャーナル||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|出版ステータス||Published - 1999|
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