Depth profiling of thin surface layers using the amplitude modulation method in radiofrequency-powered glow discharge optical emission spectrometry

Kazuaki Wagatsuma

研究成果: Article査読

10 被引用数 (Scopus)

抄録

A novel technique for accurate in-depth analysis of thin layers is described. Radiofrequency voltages applied to a Grimm-style glow discharge lamp are modulated at a very low frequency, which leads to a reduction in the sputtering rate and variation of the emission signals at the specific modulation frequency. With amplitude modulation associated with phase-sensitive detection, the resultant emission intensities can be measured with better signal-to-noise ratios, although the sputtering rate and the sampling amount are reduced by a factor of ∼10. It is possible to obtain the depth profile of a 13 nm thick Ni-electroplated layer, whereas profiling is difficult for conventional detection.

本文言語English
ページ(範囲)63-69
ページ数7
ジャーナルSurface and Interface Analysis
27
1
出版ステータスPublished - 1999 1月 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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