Deposition of a-ingaznox by rotation magnet sputtering

Akihiko Hiroe, Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi

研究成果: Conference article

1 引用 (Scopus)

抜粋

We have developed a new magnetron sputtering equipment called Rotation Magnet Sputtering (RMS), and realized the target utilization rate of more than 60%. We applied this new system to the deposition of a-InGaZnOx films. Comparison of the spatial distribution of the film characteristics between RMS and conventional magnetron sputtering revealed that film quality near erosion area is better than the rest presumably due to the heating from plasma. It was also revealed that this spatial distribution is smaller for RMS than conventional magnetron sputtering, which can be another merit of RMS.

元の言語English
ページ(範囲)760-763
ページ数4
ジャーナルDigest of Technical Papers - SID International Symposium
43
発行部数1
DOI
出版物ステータスPublished - 2012 1 1
イベント49th SID International Symposium, Seminar and Exhibition, dubbed Display Week, 2012 - Boston, United States
継続期間: 2012 6 32012 6 8

ASJC Scopus subject areas

  • Engineering(all)

フィンガープリント Deposition of a-ingazno<sub>x</sub> by rotation magnet sputtering' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用