Deposition condition and pinhole defect density of CrNx (1≥ x ≥ 0) Thin films formed by ion-beam-enhanced deposition

Hirotsugu Kondo, Noboru Akao, Nobuyoshi Hara, Katsuhisa Sugimoto

研究成果: Article査読

5 被引用数 (Scopus)

抄録

In order to produce a CrNx (1 ≥ x ≥ 0) thin film with a tow pinhole defect density using an ion-beam-enhanced deposition method, the effect of deposition conditions, such as the N2 gas flow rate, the beam current, the accelerator voltage, and the beam voltage of enhancement source, on the pinhole defect density was examined. CrNx thin films were deposited on type 304 stainless steel substrates, and then anodic polarization carves of CrNx-coated steels were measured in a deaerated 0.05 M H2SO4 + 0.005 M KSCN solution. Pinhole defect density was evaluated by the ratio of the critical passivation current density of CrNx-coated steel to that of noncoated steel. It was found that the pinhole defect density was decreased with increasing the beam voltage of the enhancement source. The lowest pinhole defect density, 0.005 area %, was obtained by the following conditions: N2 flow rate 5 sccm, Ar flow rate 3 sccm, beam current 20 mA, beam voltage 200 V, accelerator voltage 600 V, and film thickness 65 nm.

本文言語English
ページ(範囲)B60-B67
ジャーナルJournal of the Electrochemical Society
150
2
DOI
出版ステータスPublished - 2003 2月

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

フィンガープリント

「Deposition condition and pinhole defect density of CrNx (1≥ x ≥ 0) Thin films formed by ion-beam-enhanced deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル