Depletion and enhancementmode modulationdoped fieldeffect transistors for ultrahighspeed applications: an electrochemical fabrication technology

Dong Xu, Tetsuya Suemitsu, Jiro Osaka, Yohtaro Umeda, Yasuro Yamane, Yasunobu Ishii, Tetsuyoshi Ishii, Toshiaki Tamamura

研究成果: Article査読

1 被引用数 (Scopus)

抄録

This paper is devoted to an electrochemicaletchingbased technology for fabricating highperformance MODFET's for highspeed applications. The electrochemical etching in the gate openings is induced by the exposure of the Ni surface metal on the ohmic electrodes. It results in very slender gaterecess grooves which are desirable for highspeed MODFET's because of the resulting achievable small gatetochannel separation and low parasitic resistance. The technology is easy to implement and is effective for enhancing the aspect ratio. Good control of aspect ratio is essential for achieving excellent device performance and limiting deleterious shortchannel effects. Successful vertical scaling together with minimization of gate length by wellestablished electronbeam lithography using fullereneincorporated electronbeam resist leads to the realization of both optimal D and Emode MODFET's with ultrahigh extrinsic transconductance values and current gain cutoff frequencies. Fully passivated 0.07nm DMODFET's with 2.25 S/mm extrinsic transconductance and current gain cutoff frequency exceeding 300 GHz have been successful fabricated. In addition 0.03|m EMODFET's with 2 S/mm transconductance and 300 GHz current gain cutoff frequency have been demonstrated. This electrochemicaletchingbased technology provides both highperformance D and EMODFET's and therefore opens up the possibility to achieve ultrahighspeed IC's based on DCFL configurations.

本文言語English
ページ数1
ジャーナルIEEE Transactions on Electron Devices
47
1
出版ステータスPublished - 2000 12月 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

フィンガープリント

「Depletion and enhancementmode modulationdoped fieldeffect transistors for ultrahighspeed applications: an electrochemical fabrication technology」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル