Dependence of Magnetostriction of Sputtered Tb-Fe Films on Preparation Conditions

Yoshiaki Hayashi; T. Honda; K. I. Arai; Kazushi Ishiyama; Masahiro Yamaguchi

doi:10.1109/20.280877

Dependence of Magnetostriction of Sputtered Tb-Fe Films on Preparation Conditions

Yoshiaki Hayashi, T. Honda, K. I. Arai, Kazushi Ishiyama, Masahiro Yamaguchi

研究成果: Article › 査読

51 被引用数 (Scopus)

抄録

Amorphous Tb-Fe thin films prepared by sputtering method in the compositional range Tb_xFe_1-x(x=0-0.5) have been investigated in view of their potential for use in electromagnetic thin film actuators. We examined the magnetostriction and the coercive force for the Tb-Fe films for different sputtering conditions to obtain both soft magnetic properties and large magnetostriction in this system. As a result, we obtained Tb-Fe thin films having large magnetostrictions (180×10^-6at 1kOe) and low coercive force (60–70 Oe). These films were prepared under the conditions of the composition of 45-50at%Tb, Ar gas pressure of 4mTorr, rf input power of 200W and using water cooled substrates. A trial actuator using magnetostrictive thin films is also reported.

本文言語	English
ページ（範囲）	3129-3131
ページ数	3
ジャーナル	IEEE Transactions on Magnetics
巻	29
号	6
DOI	https://doi.org/10.1109/20.280877
出版ステータス	Published - 1993 1月 1

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
電子工学および電気工学

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10.1109/20.280877

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AU - Yamaguchi, Masahiro

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Dependence of Magnetostriction of Sputtered Tb-Fe Films on Preparation Conditions

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