抄録
Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8 mrad which was explained by the calculated value of 3.9 mrad. The mirror was deflected by 100 nm with the top-flat shape, which also agreed well with the proposed analysis.
本文言語 | English |
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ページ(範囲) | 26-33 |
ページ数 | 8 |
ジャーナル | Electronics and Communications in Japan |
巻 | 95 |
号 | 8 |
DOI | |
出版ステータス | Published - 2012 8 1 |
ASJC Scopus subject areas
- Signal Processing
- Physics and Astronomy(all)
- Computer Networks and Communications
- Applied Mathematics
- Electrical and Electronic Engineering