Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

本文言語English
ページ(範囲)310-315
ページ数6
ジャーナルIEEJ Transactions on Sensors and Micromachines
131
8
DOI
出版ステータスPublished - 2011

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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