Damage-free surface treatment of carbon nanotubes and self-assembled monolayer devices using a neutral beam process for fusing top-down and bottom-up processes

Seiji Samukawa, Yasushi Ishikawa, Keiji Okumura, Yoshinori Sato, Kazuyuki Tohji, Takao Ishida

研究成果: Article査読

10 被引用数 (Scopus)

抄録

Plasma etching processes have been used for the past 30 years to shrink the pattern size of integrated devices. However, the inherent problems of plasma processes, such as ultraviolet photon radiation damage, limit the effectiveness of etching and surface treatments of nanoscale devices. To overcome these problems, we developed a neutral beam surface treatment process. The process uses neutral beams and a defect-free surface process to fabricate carbon nanotubes and self-assemble mono-layer devices. We found that neutral beams can be used to produce atomically defect-free surfaces in carbon nanotubes and organic molecules. This technique has potential for fabricating nanodevices.

本文言語English
論文番号024006
ジャーナルJournal of Physics D: Applied Physics
41
2
DOI
出版ステータスPublished - 2008 1 21

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 音響学および超音波学
  • 表面、皮膜および薄膜

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