TY - GEN
T1 - Current and future three-dimensional LSI integration technology by "chip on chip", "chip on wafer" and "wafer on wafer"
AU - Bonkohara, Manabu
AU - Motoyoshi, Makoto
AU - Kamibayashi, Kazutoshi
AU - Koyanagi, Mitsumasa
PY - 2007/6/29
Y1 - 2007/6/29
N2 - Recently the development of three dimensional LSI (3D-LSI) has been accelerated and its stage has changed from the research level or limited production level to the investigation level with a view to mass production. This paper describes the current and the future 3D-LSI technologies which we have considered and imagined. The current technology is represented by our Chip Size Package (CSP) for sensor device, for instance. In the future technology, there are five key technologies described. We consider the pros and cons of the current 3D LSI stacked approach, such as CoC (Chip on Chip), CoW (Chip on Wafer) and WoW (Wafer on Wafer). We confirmed that CoW combined with Super-Smart-Stack (SSS™) technology will shorten the process time per chip at the same level as WoW approach and is effective to minimize process cost.
AB - Recently the development of three dimensional LSI (3D-LSI) has been accelerated and its stage has changed from the research level or limited production level to the investigation level with a view to mass production. This paper describes the current and the future 3D-LSI technologies which we have considered and imagined. The current technology is represented by our Chip Size Package (CSP) for sensor device, for instance. In the future technology, there are five key technologies described. We consider the pros and cons of the current 3D LSI stacked approach, such as CoC (Chip on Chip), CoW (Chip on Wafer) and WoW (Wafer on Wafer). We confirmed that CoW combined with Super-Smart-Stack (SSS™) technology will shorten the process time per chip at the same level as WoW approach and is effective to minimize process cost.
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M3 - Conference contribution
AN - SCOPUS:34250901773
SN - 1558999272
SN - 9781558999275
T3 - Materials Research Society Symposium Proceedings
SP - 35
EP - 45
BT - Enabling Technologies for 3-D Integration
T2 - 2006 MRS Fall Meeting
Y2 - 27 November 2006 through 29 November 2006
ER -