We report on crystallization of 15.7GeO2·84.3SiO2 (in mol.%) glass by poling with ArF-laser excitation. The UV intensity was 100 (mJ/cm2)/pulse, and the number of shots was 104. The crystallites that were observed in the glass were approximately 15-20 μm in diameter. The crystallization feature was dependent on the poling electric field, showing a threshold field of ∼0.5 x 105 V/cm, beyond which crystallization occurred.
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