Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

Toyohiko J. Konno, Koichi Bandoh

研究成果: Article査読

1 被引用数 (Scopus)

抄録

We have prepared Ti1-xCx (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti0.1C0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti0.1C0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.

本文言語English
ページ(範囲)57-60
ページ数4
ジャーナルJournal of Metastable and Nanocrystalline Materials
24-25
DOI
出版ステータスPublished - 2005
外部発表はい

ASJC Scopus subject areas

  • 材料科学(その他)
  • 材料科学(全般)
  • 凝縮系物理学
  • 物理化学および理論化学

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