Crystal structure and magnetoresistance of fe10ni90 films deposited by sputter-beam method

Yukimasa Yokoyama, Satoshi Okamoto, Osamu Kitakami, Yutaka Shimada, Fuminori Watanabe, Shinji Kondo, Atsushi Hayashi, Hiroyuki Fujita

研究成果: Article

4 引用 (Scopus)

抜粋

Films of Fe10Ni90 alloy were deposited by the sputter-beam method and their magnetic properties were compared with those of films deposited by a conventional RF sputtering method. High magnetoresistance was obtained for film thickness between 550∼2250 Å. Some of the films exhibit magnetoresistance equal to the bulk value. These properties are attributed to a more enhanced crystal growth than in the RF method.

元の言語English
ページ(範囲)L1222-L1224
ジャーナルJapanese journal of applied physics
32
発行部数9
DOI
出版物ステータスPublished - 1993 9

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント Crystal structure and magnetoresistance of fe<sub>10</sub>ni<sub>90</sub> films deposited by sputter-beam method' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Yokoyama, Y., Okamoto, S., Kitakami, O., Shimada, Y., Watanabe, F., Kondo, S., Hayashi, A., & Fujita, H. (1993). Crystal structure and magnetoresistance of fe10ni90 films deposited by sputter-beam method. Japanese journal of applied physics, 32(9), L1222-L1224. https://doi.org/10.1143/JJAP.32.L1222