Control of geometry in Si-based photonic nanostructures formed by maskless wet etching process and its impact on optical properties

Yusuke Hoshi, Takeshi Tayagaki, Takanori Kiguchi, Noritaka Usami

研究成果: Article査読

9 被引用数 (Scopus)

抄録

We demonstrate that maskless wet etching of self-assembled Ge quantum dot (QD) multilayers can create large-area photonic nanostructures, and the geometry can be tuned by changing wet etching conditions. It is found that the reflectance in the near-infrared wavelength can be decreased by controlling geometry, and an increase in the depth of the photonic nanostructures results in enhancement of photoluminescence intensity from Ge QDs. These results show that control of geometry in photonic nanostructures is useful for enhancement of optical absorption in the Ge QD multilayers.

本文言語English
ページ(範囲)338-341
ページ数4
ジャーナルThin Solid Films
557
DOI
出版ステータスPublished - 2014 4月 30

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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