Contactless measurement of electrical conductivity of semiconductor wafers using the reflection of millimeter waves

Yang Ju, Kojiro Inoue, Masumi Saka, Hiroyuki Abé

研究成果: Article査読

25 被引用数 (Scopus)

抄録

We present a method for quantitative measurement of electrical conductivity of semiconductor wafers in a contactless fashion by using millimeter waves. A focusing sensor was developed to focus a 110 GHz millimeter wave beam on the surface of a silicon wafer. The amplitude and the phase of the reflection coefficient of the millimeter wave signal were measured by which electrical conductivity of the wafer was determined quantitatively, independent of the permittivity and thickness of the wafers. The conductivity obtained by this method agrees well with that measured by the conventional four-point-probe method.

本文言語English
ページ(範囲)3585-3587
ページ数3
ジャーナルApplied Physics Letters
81
19
DOI
出版ステータスPublished - 2002 11 4

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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