Combination of high-resolution RBS and angle-resolved XPS: Accurate depth profiling of chemical states

Kenji Kimura, Kaoru Nakajima, Ming Zhao, Hiroshi Nohira, Takeo Hattori, Masaaki Kobata, Eiji Ikenaga, Jung Jin Kim, Keisuke Kobayashi, Thierry Conard, Wilfried Vandervorst

研究成果: Article査読

20 被引用数 (Scopus)

抄録

A new method for the combination analysis of high-resolution Rutherford backscattering spectroscopy (HRBS) and angleresolved X-ray photoelectron spectroscopy (AR-XPS) is proposed for accurate depth profiling of chemical states. In this method, attenuation lengths (ALs) for the photoelectrons are first determined so that the AR-XPS result is consistent with the HRBS result. Depth profiling of the chemical states are then performed in the AR-XPS analysis using the composition-depth profiles obtained by HRBS as constrained conditions. This method is successfully applied to Hf-based gate stack structures demonstrating its feasibility.

本文言語English
ページ(範囲)423-426
ページ数4
ジャーナルSurface and Interface Analysis
40
3-4
DOI
出版ステータスPublished - 2008 3月
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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