Coalescence process of monodispersed Co cluster assemblies0

D. L. Peng, Toyohiko Konno, K. Wakoh, T. Hihara, K. Sumiyama

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Cluster-cluster coalescence process of monodispersed Co clusters with mean diameter d = 8.5 and 13 nm deposited a plasma-gas-condensation-type cluster beam deposition system was investigated by in situ electrical conductivity measurements and ex situ scanning electron microscopy (SEM) and transmission electron microscopy (TEM), and analyzed by percolation concept. The electrical conductivity measurement and TEM observation indicated that, below temperature T ≈ 100 °C, the Co clusters in the assemblies maintain their original structure as deposited at room temperature, while that the inter-cluster coalescence takes place at T > 100 °C, although the size distribution and the interface morphology of the clusters showed no marked change at substrate temperatures Ts ≤ 200 °C.

本文言語English
ページ(範囲)329-332
ページ数4
ジャーナルEuropean Physical Journal D
8
3
出版ステータスPublished - 2001 1 1

ASJC Scopus subject areas

  • 原子分子物理学および光学

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