Coalescence behavior of the antiphase domain in Ti3Al

Y. Koizumi, Y. Minamino, T. Nakano, Y. Umakoshi

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Coalescence behavior of antiphase domains (APDs) in Ti3Al crystals with the stoichiometric and Al-rich composition was investigated, focusing on the influence of Al concentration on the shape and the growth rate of APDs, which are closely related to the anisotropy of diffusion and antiphase boundary (APB) energy due to the hep-based ordered structure (D019-type) of Ti3Al. The change in the domain size and the shape of APDs were observed by a transmission electron microscope. The growth was much faster in Al-rich crystals than in stoichiometric crystal. The change of average domain size was not associated with a parabolic law. The activation energy of APD coalescence, approximately estimated from the temperature dependence of the coalescence rate, was smaller than that of Al-self diffusion in both compositions. No anisotropy was observed in the shape of APDs. Factors which govern the growth rate and the shape of APDs were discussed considering the diffusion mechanism in D019 structure and the change of atomic arrangement in moving antiphase domain boundaries (APDBs).

本文言語English
ページ(範囲)577-582
ページ数6
ジャーナルDefect and Diffusion Forum
194-199 PART 1
DOI
出版ステータスPublished - 2001

ASJC Scopus subject areas

  • Radiation
  • Materials Science(all)
  • Condensed Matter Physics

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