Chiral-Structure-Driven split Fermi surface properties in TaSi2, NbSi2, and VSi2

Yoshichika Onuki, Ai Nakamura, Taro Uejo, Atsushi Teruya, Masato Hedo, Takao Nakama, Fuminori Honda, Hisatomo Harima

研究成果: Article

13 引用 (Scopus)

抜粋

We carried out de Haas-van Alphen (dHvA) experiments for TaSi2, NbSi2, and VSi 2 with the hexagonal chiral structure, and compared them with the results of energy band calculations. The Fermi surface is found to be split into two different Fermi surfaces, refl ecting the non-centrosymmetric crystal structure. A magnitude of the antisymmetric spin-orbit interaction or a splitting energy between the two Fermi surfaces is determined to be 493K for dHvA branch α (α′) and 564K for branchβ (β′), where these dHvA branches correspond to main Fermi surfaces. The present splitting values are compared with 209 and 244K in NbSi2, and 19 and 39K in VSi2, respectively. The splitting energy is found to be larger in the Ta-5d conduction electrons than those with the Nb-4d and V-3d conduction electrons.

元の言語English
記事番号061018
ジャーナルjournal of the physical society of japan
83
発行部数6
DOI
出版物ステータスPublished - 2014 6 15

ASJC Scopus subject areas

  • Physics and Astronomy(all)

フィンガープリント Chiral-Structure-Driven split Fermi surface properties in TaSi<sub>2</sub>, NbSi<sub>2</sub>, and VSi<sub>2</sub>' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

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