Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

J. R. Vargas Garcia, Takashi Goto

研究成果: Review article査読

104 被引用数 (Scopus)

抄録

This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.

本文言語English
ページ(範囲)1717-1728
ページ数12
ジャーナルMaterials Transactions
44
9
DOI
出版ステータスPublished - 2003 9

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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