Chemical structures of native oxides formed during wet chemical treatments

Takeo Hattori, Kazuhiko Takase, Hiroaki Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito

    研究成果: Article査読

    54 被引用数 (Scopus)

    抄録

    The chemical structures of the native oxides formed during various wet chemical treatments were measured nondestructively by changing the effective electron escape depth. The structures of the native oxides can be characterized by the distribution of suboxide Si3+ in the native oxide films. If Si3+ is correlated with Si-H bonds, the formation rate of the native oxide during the wet chemical treatment and the interface roughness produced by photoexcited dry etching through the oxide can be explained.

    本文言語English
    ページ(範囲)296-298
    ページ数3
    ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    28
    2
    出版ステータスPublished - 1989 2

    ASJC Scopus subject areas

    • 物理学および天文学(その他)

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