Chemical states and band offsets of NH3-treated Si oxynitride films studied by high-resolution photoelectron spectroscopy

M. Oshima, S. Toyoda, J. Okabayashi, H. Kumigashira, K. Ono, M. Niwa, K. Usuda, N. Hirashita

研究成果: Article査読

6 被引用数 (Scopus)

フィンガープリント

「Chemical states and band offsets of NH<sub>3</sub>-treated Si oxynitride films studied by high-resolution photoelectron spectroscopy」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy