Chemical stability improvement in IGZO using selective laser annealing system

Tetsuya Goto, Kaori Saito, Fuminobu Imaizumi, Michinobu Mizumura, Akira Suwa, Hiroshi Ikenoue, Shigetoshi Sugawa

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

Selective laser annealing system using KrF excimer laser was applied to amorphous IGZO films. IGZO film was crystallized for the laser-irradiated area (60µm square), where the chemical stability against acid solutions was improved. The stability against the negative bias illumination stress for the laser-treated TFT was improved. Furthermore, TFT could be fabricated without the photo lithography for the island patterning.

本文言語English
ページ(範囲)604-607
ページ数4
ジャーナルDigest of Technical Papers - SID International Symposium
48
1
DOI
出版ステータスPublished - 2017 1 1
イベントSID Symposium, Seminar, and Exhibition 2017, Display Week 2017 - Los Angeles, United States
継続期間: 2017 5 212017 5 26

ASJC Scopus subject areas

  • 工学(全般)

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