Chemical mechanical properties of perovskite oxide abrasive grain: First-principles approach

Nobuki Ozawa, Yuji Higuchi, Momoji Kubo

研究成果: Conference contribution

抄録

To elucidate the chemical mechanical polishing (CMP) performance of perovskite oxide abrasive grain for glass, we investigated electronic states of CaZrO3 and SrFeO3 by the first-principles calculation. The calculation results show that the Zr and Fe atoms in CaZrO3 and SrFeO3 take low valence states. We suggest that the metal atoms in perovskite oxide are effective for the glass polishing since low-valent metal atoms can weaken the Si-O bond of the glass surface by electron donation based on our reported CMP mechanism of glass by CeO2 abrasive grains.

本文言語English
ホスト出版物のタイトルICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014
出版社Institute of Electrical and Electronics Engineers Inc.
ページ203-204
ページ数2
ISBN(電子版)9781479955565
DOI
出版ステータスPublished - 2015 1月 20
イベント11th International Conference on Planarization/CMP Technology, ICPT 2014 - Kobe, Japan
継続期間: 2014 11月 192014 11月 21

出版物シリーズ

名前ICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014

Other

Other11th International Conference on Planarization/CMP Technology, ICPT 2014
国/地域Japan
CityKobe
Period14/11/1914/11/21

ASJC Scopus subject areas

  • 電子工学および電気工学
  • ハードウェアとアーキテクチャ

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