Characterization of high-density patterned media fabricated by a new anodizing process

Patterned media with dots of 65 nm period (153 Gdots in.2) and 25 nm period (1.03 Tdots in.2) fabricated by a new anodizing process were investigated. Write/read characteristics were successfully measured with a specific patterned marker providing an accessing method to the narrow patterned area of 10×10 μ m2. The read-back signals were obtained by a spin stand with a flying head and a static tester with a contact head. Although 1 dot resolution was not achieved in the flying write/read measurement for the media with 25 nm period (1.03 Tdots in.2), it was achieved in the contact write/read measurement.