Characterization of Fe silicide growth on Si(111) surface by weissenberg RHEED

T. Abukawa, D. Fujisaki, N. Takahashi, S. Sato

研究成果: Article査読

6 被引用数 (Scopus)

抄録

Fe silicide growth on a Si(111) surface has been characterized by Weissenberg RHEED. The silicides were grown in the present study via two fundamental methods, reactive deposition epitaxy (RDE) and solid phase epitaxy (SPE), with various deposition amounts of Fe. The silicide species and its epitaxial orientation were determined from three-dimensional diffraction patterns obtained using Weissenberg RHEED. It was found that only α-FeSi2 islands grew by the RDE method. Both α-FeSi 2 and β-FeSi2 islands grew by the SPE method. The proportion of β-FeSi2 increased with increasing Fe deposition amount, until only β-FeSi2 was finally observed. The present results could be explained by the surface or interface reaction model wherein the reaction at the Si surface and at the Fe/Si solid interface caused α-FeSi2 and β-FeSi2 growth, respectively.

本文言語English
ページ(範囲)866-870
ページ数5
ジャーナルe-Journal of Surface Science and Nanotechnology
7
DOI
出版ステータスPublished - 2009 11 7

ASJC Scopus subject areas

  • バイオテクノロジー
  • バイオエンジニアリング
  • 凝縮系物理学
  • 材料力学
  • 表面および界面
  • 表面、皮膜および薄膜

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