Characterization of damaged layer using AC surface photovoltagein silicon wafers

Osamu Kohmoto; Satoru Araki; Chester Alexander

doi:10.1143/JJAP.32.3962

Characterization of damaged layer using AC surface photovoltagein silicon wafers

Osamu Kohmoto, Satoru Araki, Chester Alexander

研究成果: Article › 査読

12 被引用数 (Scopus)

抄録

Ferromagnetic resonance in 1000-Ɨ-thick Co films evaporated on sapphire, glass or MgO substrates has been studied. An effective uniaxial anisotropy field (H_k) of -16.27 kOe and gyromagnetic ratio (े/2ॠ) of 3.10 GHz/kOe were obtained for Co film on sapphire. Assuming the saturation magnetization (4ॠM) of 17.58 kG, we derived a small intrinsic perpendicular anisotropy field (H_kC4ॠM) of 1.31 kOe.

本文言語	English
ページ（範囲）	3962-3963
ページ数	2
ジャーナル	Japanese journal of applied physics
巻	32
号	9 R
DOI	https://doi.org/10.1143/JJAP.32.3962
出版ステータス	Published - 1993 9月
外部発表	はい

ASJC Scopus subject areas

工学（全般）
物理学および天文学（全般）

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10.1143/JJAP.32.3962

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title = "Characterization of damaged layer using AC surface photovoltagein silicon wafers",

abstract = "Ferromagnetic resonance in 1000-Ɨ-thick Co films evaporated on sapphire, glass or MgO substrates has been studied. An effective uniaxial anisotropy field (Hk) of -16.27 kOe and gyromagnetic ratio (े/2ॠ) of 3.10 GHz/kOe were obtained for Co film on sapphire. Assuming the saturation magnetization (4ॠM) of 17.58 kG, we derived a small intrinsic perpendicular anisotropy field (HkC4ॠM) of 1.31 kOe.",

keywords = "Anisotropy field, Cobalt, Evaporation, Fee, Ferromagnetic resonance, Film, Hcp, Linewidth, Resonance field",

author = "Osamu Kohmoto and Satoru Araki and Chester Alexander",

year = "1993",

month = sep,

doi = "10.1143/JJAP.32.3962",

language = "English",

volume = "32",

pages = "3962--3963",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "9 R",

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TY - JOUR

T1 - Characterization of damaged layer using AC surface photovoltagein silicon wafers

AU - Kohmoto, Osamu

AU - Araki, Satoru

AU - Alexander, Chester

PY - 1993/9

Y1 - 1993/9

N2 - Ferromagnetic resonance in 1000-Ɨ-thick Co films evaporated on sapphire, glass or MgO substrates has been studied. An effective uniaxial anisotropy field (Hk) of -16.27 kOe and gyromagnetic ratio (े/2ॠ) of 3.10 GHz/kOe were obtained for Co film on sapphire. Assuming the saturation magnetization (4ॠM) of 17.58 kG, we derived a small intrinsic perpendicular anisotropy field (HkC4ॠM) of 1.31 kOe.

AB - Ferromagnetic resonance in 1000-Ɨ-thick Co films evaporated on sapphire, glass or MgO substrates has been studied. An effective uniaxial anisotropy field (Hk) of -16.27 kOe and gyromagnetic ratio (े/2ॠ) of 3.10 GHz/kOe were obtained for Co film on sapphire. Assuming the saturation magnetization (4ॠM) of 17.58 kG, we derived a small intrinsic perpendicular anisotropy field (HkC4ॠM) of 1.31 kOe.

KW - Anisotropy field

KW - Cobalt

KW - Evaporation

KW - Fee

KW - Ferromagnetic resonance

KW - Film

KW - Hcp

KW - Linewidth

KW - Resonance field

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DO - 10.1143/JJAP.32.3962

M3 - Article

AN - SCOPUS:0027659780

SN - 0021-4922

VL - 32

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EP - 3963

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 9 R

ER -

Characterization of damaged layer using AC surface photovoltagein silicon wafers

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