Characteristics of RF H- ion source by using FET power source

A. Ando, C. H. Moon, J. Komuro, K. Tsumori, Y. Takeiri

研究成果: Conference article査読

3 被引用数 (Scopus)


Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 1018m-3 is produced in argon plasma with lkW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 1018m-3 is obtained at the hydrogen gas pressure around lPa with the help of the axial magnetic field.

ジャーナルAIP Conference Proceedings
出版ステータスPublished - 2009
イベント1st International Symposium on Negative Ions, Beams and Sources - Aix-en-Provence, France
継続期間: 2008 9月 92008 9月 12

ASJC Scopus subject areas

  • 物理学および天文学(全般)


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