Characteristics of a 40.68-MHz radio frequency boosted low power glow discharge lamp

Hideyuki Matsuta, Kuniyuki Kitagawa, Kazuaki Wagatsuma

研究成果: Article査読

5 被引用数 (Scopus)

抄録

In order to perform precise depth profiling of conducting solid sample, a DC glow discharge lamp is often operated under low power conditions. Since a DC glow discharge at low power conditions gives low excitation, an additional boosting method having no influence on the cathodic sputtering (sampling process) is needed to obtain an emission intensity enough for precise depth profiling. When the frequency of a radio frequency (RF) discharge increases, the DC bias voltage decreases, yielding less sputtering. At 40.68 MHz, almost no sputtering occurs. When a DC discharge and such a 40.68-MHz RF discharge are combined, sputtering and excitation can be controlled independently. It is found (by selecting only the RF-excited spectra using a modulation technique) that higher excitation and emission (at least for excited levels below 15 eV) occur due to the RF-power, compared to a pure DC discharge at low power conditions. Since emission signal from the DC glow discharge can be eliminated by using modulation technique, interpretation of spectral intensity-time relationship is simple, regardless of DC glow discharge conditions for cathodic sputtering. Such a characteristic is advantageous in a precise profiling.

本文言語English
ページ(範囲)1783-1792
ページ数10
ジャーナルSpectrochimica Acta - Part B Atomic Spectroscopy
54
13
DOI
出版ステータスPublished - 1999 12月 13

ASJC Scopus subject areas

  • 分析化学
  • 原子分子物理学および光学
  • 器械工学
  • 分光学

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