A capacitive AFM probe having capacitive structure was fabricated by micromachining techniques. For obtaining a high sensitivity and a low voltage-actuation, the thin micro sensor consists of a single crystalline-silicon with a narrow gap between micro-cantilever and opposite electrode was fabricated. The gap is 1μm, the thickness of the cantilever is 0.5μm, and the size is 80×100 μm. As a result of evaluation of the performance, the micro-probe showed a sufficient performance for nanometric sensing. The capacitive AFM probe has a both functions for sensing and actuation, because the deflection of the micro-cantilever can be measured from the capacitance, and the micro-cantilever can be electrostatically actuated. By reducing the cantilever size, the operation with a high speed imaging is expected.
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