Broadening the applications of the atom probe technique by ultraviolet femtosecond laser

K. Hono, T. Ohkubo, Y. M. Chen, M. Kodzuka, K. Oh-ishi, H. Sepehri-Amin, F. Lia, T. Kinno, S. Tomiya, Y. Kanitani

研究成果: Article査読

77 被引用数 (Scopus)

抄録

Laser assisted field evaporation using ultraviolet (UV) wavelength gives rise to better mass resolution and signal-to-noise ratio in atom probe mass spectra of metals, semiconductors and insulators compared to infrared and green lasers. Combined with the site specific specimen preparation techniques using the lift-out and annular Ga ion milling in a focused ion beam machine, a wide variety of materials including insulating oxides can be quantitatively analyzed by the three-dimensional atom probe using UV laser assisted field evaporation. After discussing laser irradiation conditions for optimized atom probe analyses, recent atom probe tomography results on oxides, semiconductor devices and grain boundaries of sintered magnets are presented.

本文言語English
ページ(範囲)576-583
ページ数8
ジャーナルUltramicroscopy
111
6
DOI
出版ステータスPublished - 2011
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 器械工学

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