TY - JOUR
T1 - Bias-voltage application in hard x-ray photoelectron spectroscopy for characterization of advanced materials
AU - Yamashita, Yoshiyuki
AU - Ohmori, Kenji
AU - Ueda, Shigenori
AU - Yoshikawa, Hideki
AU - Chikyow, Toyohiro
AU - Kobayashi, Keisuke
N1 - Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
PY - 2010/2/27
Y1 - 2010/2/27
N2 - We employed bias-voltage-application in hard x-ray photoelectron spectroscopy (BA-HXPES) to detect electronic states of materials in operating devices. To demonstrate the versatility of this method, we used a metal/SiO 2/Si(100) structure as an ideal platform and found that electronic states at the SiO2/Si(100) interface were changed depending on the bias-application to the structure. By analyzing the change as a function of bias-voltage, the interface electronic states in the whole Si gap have been directly obtained in which these states cannot be detected without the bias-application. BA-HXPES is a new method to characterize electronic states for advanced materials under device operation.
AB - We employed bias-voltage-application in hard x-ray photoelectron spectroscopy (BA-HXPES) to detect electronic states of materials in operating devices. To demonstrate the versatility of this method, we used a metal/SiO 2/Si(100) structure as an ideal platform and found that electronic states at the SiO2/Si(100) interface were changed depending on the bias-application to the structure. By analyzing the change as a function of bias-voltage, the interface electronic states in the whole Si gap have been directly obtained in which these states cannot be detected without the bias-application. BA-HXPES is a new method to characterize electronic states for advanced materials under device operation.
KW - Crystalline-amorphous interfaces
KW - Silicon
KW - X-ray photoelectron spectroscopy
UR - http://www.scopus.com/inward/record.url?scp=77952784663&partnerID=8YFLogxK
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U2 - 10.1380/ejssnt.2010.81
DO - 10.1380/ejssnt.2010.81
M3 - Article
AN - SCOPUS:77952784663
VL - 8
SP - 81
EP - 83
JO - e-Journal of Surface Science and Nanotechnology
JF - e-Journal of Surface Science and Nanotechnology
SN - 1348-0391
ER -