Ba2NaNb5O15 thin film formed by electron cyclotron resonance plasma sputtering

A. Watazu, H. Masumoto

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

Ba2NaNb5O15 (BNN) thin films were formed on sapphire (0001) substrates and magnesium oxide substrates using electron cyclotron resonance plasma sputtering. The BNN films were 7.2-8.4 μm thick and had atomic ratio compositions of Ba=2.0-2.1/5Nb and Na=0.9-1.1/5Nb. The films had no cracks. Single-phase BNN and (001)-oriented BNN films on sapphire (0001) were obtained at 823 K and 923 K. An in-plane-oriented BNN film on sapphire (0001) was formed at 923 K. The films were transparent and had the ability of second harmonic generation. The films on magnesium oxide (100) were also single-phase BNN, and (001)-oriented BNN films were obtained at 823 K, 873 K, and 923 K. An in-plane-oriented BNN film on magnesium oxide (100) was formed at 823 K. The films were transparent.

本文言語English
論文番号012066
ジャーナルJournal of Physics: Conference Series
417
1
DOI
出版ステータスPublished - 2013
イベント15th International Conference on Thin Films, ICTF 2011 - Kyoto, Japan
継続期間: 2011 11 82011 11 11

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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