Autocatalytic reaction model: A phenomenology for nucleation-coalescence-growth of thin films

Maki Suemitsu, Hideaki Togashi, Toshimi Abe

研究成果: Conference article査読

7 被引用数 (Scopus)

抄録

In many thin film growth systems, the surface morphology develops via nucleation of two-dimensional clusters, their growth and coalescence. When desorption of surface adsorbate is thermally activated, time evolution of the film's coverage becomes a delicate function of both the temperature and pressure of the growth. The autocatalytic reaction (ACR) model, a rate equation known in chemical kinetics, is a powerful tool to describe such complicated temporal behaviors, and is successfully applied to analysis of dry oxidation at Si(001)-2×1 surfaces. Monte Carlo simulation indicates that the physics behind the ACR model lies in its effective inclusion of nucleation, growth, and coalescence processes.

本文言語English
ページ(範囲)83-86
ページ数4
ジャーナルThin Solid Films
428
1-2
DOI
出版ステータスPublished - 2003 3 20
イベントProceedings of Symposium J on Growth and Evolution - Strasbourg, France
継続期間: 2002 6 182002 6 21

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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