Atomic-scale structure of CVO amorphous Si3N4-BN composite

Toshiharu Fukunaga, Takashi Goto, Masakatsu Misawa, Toshio Hirai, Kenji Suzuki

研究成果: Article査読

15 被引用数 (Scopus)

抄録

The atomic structure of amorphous Si3N4-BN composite prepared by CVD has been investigate by neutron total scattering. The small angle scattering intensity observed previously in S(Q) of amorphous Si3N4 has not been observed in case of amorphous Si3N4-BN composite. This may show that the voids of about 10 A in diameter, contained in amorphous Si3N4, are occupied by turbostratic BN in amorphous Si3N4-BN composite. This turbostratic BN can be presumed to be built of frustrated hexagonal layers, based on the coordination number and bond length of the B-N first neighbor correlation.

本文言語English
ページ(範囲)1119-1125
ページ数7
ジャーナルJournal of Non-Crystalline Solids
95-96
PART 2
DOI
出版ステータスPublished - 1987 12月 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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