A calculation method of the atomic flux divergence due to electromigration, AFDgen, has been proposed considering two-dimensional distributions of current density and temperature and also simply considering the line structure of not only polycrystalline line but also bamboo line. The validity of AFDgen for bamboo lines has been verified in comparison of void formation calculated by using AFDgen with experimental results, and it has been shown that void formation in bamboo line is able to be predicted by using AFDgen. In this study, angled bamboo lines are treated for prediction of hillock formation, and hillock formation predicted by using AFDgen is compared with that measured in experiment. In addition to the verification of void prediction, the usefulness of the prediction method for electromigration damage using AFDgen is discussed in more detail.
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