Atom probe study of erbium and oxygen co-implanted silicon

Yasuo Shimizu, Yuan Tu, Ayman Abdelghafar, Maasa Yano, Yudai Suzuki, Takashi Tanii, Takahiro Shinada, Enrico Prati, Michele Celebrano, Marco Finazzi, Lavinia Ghirardini, Koji Inoue, Yasuyoshi Nagai

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

It has been reported that erbium (Er) is a source of optical emission at λ=1.54 pm due to 4I13/24I15/2 transition of Er3+. A method of oxygen (O) codoping with Er has attracted attention as a candidate for obtaining more efficient optical gain by forming Er:O complex. Although several simulations predict the equilibrium structure of Er:O complex, it is difficult to understand experimentally how related between these implanted ions followed by annealing for optical activation. In this workshop, we reported the preliminary results on three-dimensional distributions of Er and O co-implanted into Si investigated by atom probe tomography.

本文言語English
ホスト出版物のタイトル2017 Silicon Nanoelectronics Workshop, SNW 2017
出版社Institute of Electrical and Electronics Engineers Inc.
ページ99-100
ページ数2
ISBN(電子版)9784863486478
DOI
出版ステータスPublished - 2017 12 29
イベント22nd Silicon Nanoelectronics Workshop, SNW 2017 - Kyoto, Japan
継続期間: 2017 6 42017 6 5

出版物シリーズ

名前2017 Silicon Nanoelectronics Workshop, SNW 2017
2017-January

Other

Other22nd Silicon Nanoelectronics Workshop, SNW 2017
国/地域Japan
CityKyoto
Period17/6/417/6/5

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 電子材料、光学材料、および磁性材料

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