Atom probe compositional analysis of Co-Cr sputtered magnetic thin films

K. Hono; S. S. Babu; Y. Maeda; N. Hasegawa; Toshio Sakurai

doi:10.1063/1.109336

Atom probe compositional analysis of Co-Cr sputtered magnetic thin films

K. Hono, S. S. Babu, Y. Maeda, N. Hasegawa, Toshio Sakurai

研究成果: Article › 査読

26 被引用数 (Scopus)

抄録

A Co-22 at. % magnetic thin film, sputter deposited on a heated Cu coated Si substrate, was analyzed in the planar direction of the film by atom probe field ion microscopy (APFIM). The atom probe concentration depth profile convincingly showed that the film contained two phases, one enriched in Cr up to 30-35 at. % and the other enriched in Co up to 95-93 at. %. This result indicates that Co-22 at. % Cr thin film deposited on a heated substrate consists of ferromagnetic and paramagnetic phases, each less than a few tens of nanometers in size.

本文言語	English
ページ（範囲）	2504-2506
ページ数	3
ジャーナル	Applied Physics Letters
巻	62
号	20
DOI	https://doi.org/10.1063/1.109336
出版ステータス	Published - 1993 12 1

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

文献へのアクセス

10.1063/1.109336

フィンガープリント「Atom probe compositional analysis of Co-Cr sputtered magnetic thin films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

@article{0c007f6efbd5463c943b7d756cd83e6d,

title = "Atom probe compositional analysis of Co-Cr sputtered magnetic thin films",

abstract = "A Co-22 at. % magnetic thin film, sputter deposited on a heated Cu coated Si substrate, was analyzed in the planar direction of the film by atom probe field ion microscopy (APFIM). The atom probe concentration depth profile convincingly showed that the film contained two phases, one enriched in Cr up to 30-35 at. % and the other enriched in Co up to 95-93 at. %. This result indicates that Co-22 at. % Cr thin film deposited on a heated substrate consists of ferromagnetic and paramagnetic phases, each less than a few tens of nanometers in size.",

author = "K. Hono and Babu, {S. S.} and Y. Maeda and N. Hasegawa and Toshio Sakurai",

year = "1993",

month = dec,

day = "1",

doi = "10.1063/1.109336",

language = "English",

volume = "62",

pages = "2504--2506",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "20",

}

TY - JOUR

T1 - Atom probe compositional analysis of Co-Cr sputtered magnetic thin films

AU - Hono, K.

AU - Babu, S. S.

AU - Maeda, Y.

AU - Hasegawa, N.

AU - Sakurai, Toshio

PY - 1993/12/1

Y1 - 1993/12/1

N2 - A Co-22 at. % magnetic thin film, sputter deposited on a heated Cu coated Si substrate, was analyzed in the planar direction of the film by atom probe field ion microscopy (APFIM). The atom probe concentration depth profile convincingly showed that the film contained two phases, one enriched in Cr up to 30-35 at. % and the other enriched in Co up to 95-93 at. %. This result indicates that Co-22 at. % Cr thin film deposited on a heated substrate consists of ferromagnetic and paramagnetic phases, each less than a few tens of nanometers in size.

AB - A Co-22 at. % magnetic thin film, sputter deposited on a heated Cu coated Si substrate, was analyzed in the planar direction of the film by atom probe field ion microscopy (APFIM). The atom probe concentration depth profile convincingly showed that the film contained two phases, one enriched in Cr up to 30-35 at. % and the other enriched in Co up to 95-93 at. %. This result indicates that Co-22 at. % Cr thin film deposited on a heated substrate consists of ferromagnetic and paramagnetic phases, each less than a few tens of nanometers in size.

UR - http://www.scopus.com/inward/record.url?scp=0000036554&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000036554&partnerID=8YFLogxK

U2 - 10.1063/1.109336

DO - 10.1063/1.109336

M3 - Article

AN - SCOPUS:0000036554

VL - 62

SP - 2504

EP - 2506

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 20

ER -