抄録
The fabrication of mesoporous tungsten oxide films by spin-coating method followed by an atmospheric plasma-calcination method is described and discussed here. For the calcination process the dielectric barrier discharge system generating homogenous atmospheric plasma discharge was designed and used. By this method, large surface area mesoporous films, with disordered pores of average diameter size of about 4 to 5 nm were synthesized. All the plasma-calcined films exhibit amorphous structure. The process of calcination was evaluated by FT-IR spectroscopy and in comparison with other methods a very high speed of calcination process was achieved.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 4905-4908 |
| ページ数 | 4 |
| ジャーナル | Thin Solid Films |
| 巻 | 515 |
| 号 | 12 |
| DOI | |
| 出版ステータス | Published - 2007 4月 23 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 表面および界面
- 表面、皮膜および薄膜
- 金属および合金
- 材料化学