Application of rotation magnet sputtering technology to a-IGZO film depositions

研究成果: Article査読

3 被引用数 (Scopus)

抄録

We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.

本文言語English
ページ(範囲)5-8
ページ数4
ジャーナルDigest of Technical Papers - SID International Symposium
45
1
DOI
出版ステータスPublished - 2014 6

ASJC Scopus subject areas

  • 工学(全般)

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