We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.
|ジャーナル||Digest of Technical Papers - SID International Symposium|
|出版ステータス||Published - 2014 6|
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